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Canon plans to introduce low-cost chip-making machinery that uses nanoimprint microimaging technology to stamp chip designs onto silicon wafers at a price that is said to be one zero lower than ASML’s equipment.
The technology does not use light etching, is one digit cheaper than extreme ultraviolet (EUV) microscopic technology, and reduces the power of up to 90%. It is expected to ship as early as this year and can be used to produce advanced semiconductors for smartphones, artificial intelligence and weapons systems.
Canon emphasizes coexistence with EUV and other technologies, but analysts are skeptical about its impact, arguing that nanoimprint technology is already widely used. The company’s challenge is to increase the success rate of the scaling process to 2nm.
(Source: enanyang Image source: freepik)
